Ichiro Mori
Consultant at FUJIFILM Electronic Materials Co Ltd
SPIE Involvement:
Conference Co-Chair | Author
Publications (38)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Multilayers, Lithographic illumination, Defect detection, Light scattering, Inspection, CCD cameras, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Lithographic illumination, Defect detection, Data modeling, Inspection, Ray tracing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Mirrors, Manufacturing, Inspection, Ray tracing, Photomasks, Extreme ultraviolet, Image classification, Extreme ultraviolet lithography, Geometrical optics

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Mirrors, Multilayers, Switches, Defect detection, Ions, Inspection, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Metrology, Defect detection, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Prototyping, Defect inspection

Showing 5 of 38 publications
Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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