Ichirota Nagahama
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Electron beams, Inspection, Scanning electron microscopy, Optical inspection, Wafer inspection, Photomasks, Mask making, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Double patterning technology, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Optical lithography, Metals, Inspection, Optical inspection, Wafer inspection, Photomasks, Optical proximity correction, Semiconducting wafers, CMOS devices

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Thin films, Electron beams, Silica, Silicon, Inspection, Electron microscopy, Photomasks, Semiconducting wafers, Signal detection, Defect inspection

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electron beams, Defect detection, Inspection, Distortion, Scanning electron microscopy, Electron microscopy, Spatial resolution, Neodymium, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Electron beams, Imaging systems, Inspection, Optical inspection, Electron microscopy, Spatial resolution, Semiconducting wafers, Signal detection, Yield improvement

Showing 5 of 8 publications
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