Dr. Idriss Blakey Profile

Dr. Idriss Blakey

Associate Professor at Univ of Queensland

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Publications (22)

Proceedings Article | 1 May 2023 Presentation + Paper

Fundamental studies of interactions between polymer substrate and precursor in sequential infiltration synthesis

Andrew Whittaker, Francis McCallum, Jiacheng Zhao, Md. Daloar Hossain, Joshua Kaitz, James Cameron, Peter Trefonas, Idriss Blakey, Hui Peng

Proceedings Volume 12498, 124980U (2023) https://doi.org/10.1117/12.2655986

KEYWORDS: Polymers, Polymethylmethacrylate, Spectroscopy, Molecular interactions, Molecules, FT-IR spectroscopy, Atomic layer deposition, Vacuum, Silicon, Semiconducting wafers

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Proceedings Article | 22 February 2021 Presentation + Paper

Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates

Jiacheng Zhao, Francis McCallum, Zhen Jiang, Joshua Kaitz, James Cameron, Peter Trefonas, Idriss Blakey, Hui Peng, Andrew Whittaker

Proceedings Volume 11612, 116120Q (2021) https://doi.org/10.1117/12.2586516

KEYWORDS: Nanostructures, Photomasks, Nanolithography, Control systems, Ultraviolet radiation, Thin films, Nanodomains, Interfaces, Fabrication, Electron beams

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Proceedings Article | 27 March 2017 Presentation + Paper

Embedded top-coat for reducing the effect out of band radiation in EUV lithography

Ke Du, Meiliana Siauw, David Valade, Peter Trefonas, Jim Thackeray, Andrew Whittaker, Idriss Blakey, Marek Jasieniak, Nico Voelcker

Proceedings Volume 10146, 101460D (2017) https://doi.org/10.1117/12.2270480

KEYWORDS: Polymers, Polymerization, Extreme ultraviolet lithography, Electron beam lithography, Photoresist materials, Polymer thin films, Extreme ultraviolet, Semiconducting wafers, Refractive index, Absorbance

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Proceedings Article | 21 March 2016 Paper

Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists

Meiliana Siauw, James Thackeray, Andrew Whittaker, Peter Trefonas, Idriss Blakey, Ke Du, David Valade

Proceedings Volume 9779, 97790J (2016) https://doi.org/10.1117/12.2219638

KEYWORDS: Nanoparticles, Metals, Oxides, Extreme ultraviolet lithography, Photoresist materials, Optical lithography, Electron beam lithography, Scanning electron microscopy, Materials processing, Photoresist developing, Particles, Zirconium, Hafnium, Transmission electron microscopy

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SPIE Journal Paper | 21 July 2014

Can ionic liquid additives be used to extend the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly?

Thomas Bennett, Kevin Pei, Han-Hao Cheng, Kristofer Thurecht, Kevin Jack, Idriss Blakey

JM3, Vol. 13, Issue 03, 031304, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031304

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, Thin films, Liquids, Polymers, Scattering, Scanning electron microscopy, Laser scattering, Annealing, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly

Han-Hao Cheng, Idriss Blakey, Thomas Bennett, Kevin Jack, Kristofer Thurecht, Kevin Pei

Proceedings Volume 9049, 90490R (2014) https://doi.org/10.1117/12.2046296

KEYWORDS: Liquids, Picosecond phenomena, Scattering, Thin films, Polymers, Scanning electron microscopy, Semiconducting wafers, Annealing, X-rays, Directed self assembly

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Proceedings Article | 4 March 2014 Paper

SERS-barcoded colloidal gold NP assemblies as imaging agents for use in biodiagnostics

William Olds, Emad Izake, Priyanka Dey, Idriss Blakey, Kristofer Thurecht, Peter Fredericks

Proceedings Volume 8939, 89390A (2014) https://doi.org/10.1117/12.2037159

KEYWORDS: Gold, Neptunium, Surface enhanced Raman spectroscopy, Tissues, Raman spectroscopy, Polymers, Tissue optics, Molecular assembly, Raman scattering, Nanoparticles

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Proceedings Article | 26 March 2013 Paper

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers

Idriss Blakey, Ya-Mi Chuang, Han-Hao Cheng, Kevin Jack, Andrew Whittaker

Proceedings Volume 8680, 868009 (2013) https://doi.org/10.1117/12.2012488

KEYWORDS: Polymers, Annealing, Line edge roughness, Lithography, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Directed self assembly, Extreme ultraviolet lithography, Photoresist materials

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Proceedings Article | 21 March 2012 Paper

EUVL compatible LER solutions using functional block copolymers

Kevin Jack, Todd Younkin, Ya-Mi Chuang, Han-Hao Cheng, Idriss Blakey, Anguang Yu, Michael Leeson, Andrew Whittaker, Imelda Keen

Proceedings Volume 8323, 83231O (2012) https://doi.org/10.1117/12.916744

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Picosecond phenomena, Polymers, Lithography, Directed self assembly, Photoresist materials, Etching, Glasses, Reactive ion etching

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Proceedings Article | 24 December 2011 Paper

Effect of nanoholes on the plasmonic properties of star nanostructures

Andrew Whittaker, Idriss Blakey, Shaoli Zhu

Proceedings Volume 8204, 82042M (2011) https://doi.org/10.1117/12.905409

KEYWORDS: Nanostructures, Plasmonics, Finite-difference time-domain method, Stars, Silver, Near field, Nano optics, Computer simulations, Numerical simulations, Nanoparticles

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Proceedings Article | 16 April 2011 Paper

Sensitive polysulfone based chain scissioning resists for 193nm lithography

Andrew Whittaker, Idriss Blakey, Anneke Dorgelo, Yong Keng Goh, Lan Chen, Warren Montgomery, Xie Peng, Bruce Smith, Neal Lafferty, Paul Zimmerman

Proceedings Volume 7972, 79722E (2011) https://doi.org/10.1117/12.881700

KEYWORDS: Line edge roughness, Polymers, Absorbance, Water, Sulfur, Scanning electron microscopy, Lithography, Double patterning technology, 193nm lithography, Coating

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Proceedings Article | 4 April 2011 Paper

Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications

Idriss Blakey, Kevin Jack, Andrew Whittaker, Ya-Mi Chuang, Han-Hao Cheng, Todd Younkin, Anguang Yu, Imelda Keen, Michael Leeson

Proceedings Volume 7970, 79701V (2011) https://doi.org/10.1117/12.881491

KEYWORDS: Electron beam lithography, Annealing, Double patterning technology, Extreme ultraviolet, Line edge roughness, Electron beams, Directed self assembly, Scanning electron microscopy, Extreme ultraviolet lithography, Photoresist materials

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Proceedings Article | 30 March 2010 Paper

Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

Kirsten Lawrie, Warren Montgomery, Bruce Smith, Paul Zimmerman, Lan Chen, Andrew Whittaker, Idriss Blakey, Yong-Keng Goh

Proceedings Volume 7639, 76390V (2010) https://doi.org/10.1117/12.846971

KEYWORDS: Polymers, Absorbance, Lithography, Line edge roughness, Polymerization, Optical lithography, Water, Immersion lithography, Semiconducting wafers, Refractive index

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Proceedings Article | 23 March 2010 Paper

Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

Idriss Blakey, Wang Yueh, James Blinco, Heping Liu, Anguang Yu, Todd Younkin, Michael Leeson, Kevin Jack, Andrew Whittaker

Proceedings Volume 7636, 763635 (2010) https://doi.org/10.1117/12.853620

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Absorbance, Optical lithography, Semiconducting wafers, Carbonates, Scanning electron microscopy, Photoresist materials

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Proceedings Article | 1 April 2009 Paper

Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity

Ya-Mi Chuang, Emil Piscani, Yong-Keng Goh, Kirsten Lawrie, Andrew Whittaker, Idriss Blakey, Paul Zimmerman, Lan Chen

Proceedings Volume 7273, 72733X (2009) https://doi.org/10.1117/12.814076

KEYWORDS: Polymers, Photons, Immersion lithography, Semiconducting wafers, Absorbance, Polymer thin films, FT-IR spectroscopy, Polymethylmethacrylate, Ionizing radiation, Optical lithography

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Proceedings Article | 1 April 2009 Paper

Development of polymers for non-CAR resists for EUV lithography

Andrew Whittaker, Anguang Yu, Idriss Blakey, Wang Yeuh, Heping Liu, Michael Leeson, Todd Younkin, Kevin Jack, James Blinco, Kirsten Lawrie

Proceedings Volume 7273, 727321 (2009) https://doi.org/10.1117/12.820493

KEYWORDS: Polymers, Photons, Stars, Extreme ultraviolet, Polymethylmethacrylate, Extreme ultraviolet lithography, Polymerization, Etching, Resistance, Magnesium

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Proceedings Article | 15 April 2008 Paper

Development of an operational high refractive index resist for 193nm immersion lithography

Christopher Ober, Paul Zimmerman, Idriss Blakey, Bronwin Dargaville, Andrew Whittaker, Jeffrey Byers, Lan Chen, Dongyan Wang, Emil Piscani, Robert Rodriguez, Heping Liu, Bryan Rice, Emmanuel Giannelis

Proceedings Volume 6923, 692306 (2008) https://doi.org/10.1117/12.772871

KEYWORDS: Nanoparticles, Refractive index, Absorbance, Immersion lithography, Polymers, Lithography, Chemistry, Chlorine, Sulfur, Line edge roughness

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SPIE Journal Paper | 1 April 2008

Application of quantitative structure property relationship to the design of high refractive index 193i resist

Heping Liu, Idriss Blakey, Willard Conley, Graeme George, David Hill, Andrew Whittaker

JM3, Vol. 7, Issue 02, 023001, (April 2008) https://doi.org/10.1117/12.10.1117/1.2908937

KEYWORDS: Chromium, Etching, Line edge roughness, Double patterning technology, Photomasks, Photoresist processing, Refractive index, Image registration, Lithography, Scanning electron microscopy

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Proceedings Article | 6 April 2007 Paper

The rational design of polymeric EUV resist materials by QSPR modelling

Justin Waterman, Heidi Cao, Andrew Whittaker, Michael Leeson, Heping Liu, Idriss Blakey, Kevin Jack, Wang Yueh, David Hill, Greg Denbeaux

Proceedings Volume 6519, 65193Z (2007) https://doi.org/10.1117/12.716213

KEYWORDS: Polymers, Extreme ultraviolet, Data modeling, Molecules, Photons, Ionization, Process modeling, Polymethylmethacrylate, Modeling, Spectroscopy

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Proceedings Article | 22 March 2007 Paper

Novel high-index resists for 193-nm immersion lithography and beyond

Heping Liu, Emil Piscani, Will Conley, Georgia Rich, Alvina Williams, Paul Zimmerman, Idriss Blakey, Bronwin Dargaville, Lan Chen, Andrew Whittaker

Proceedings Volume 6519, 651909 (2007) https://doi.org/10.1117/12.715108

KEYWORDS: Polymers, Refractive index, Polymerization, Immersion lithography, Molecules, Absorbance, Nitrogen, Data modeling, Water, Sulfur

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Proceedings Article | 29 March 2006 Paper

Synthesis of high refractive index sulfur containing polymers for 193 nm immersion lithography: a progress report

Heping Liu, David J. T. Hill, Will Conley, Idriss Blakey, Graeme George, Andrew Whittaker, Firas Rasoul

Proceedings Volume 6153, 61530H (2006) https://doi.org/10.1117/12.659757

KEYWORDS: Refractive index, Polymers, Absorbance, Molecules, Absorption, Data modeling, Sulfur, Immersion lithography, Water, Polymerization

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Proceedings Article | 4 May 2005 Paper

High-RI resist polymers for 193 nm immersion lithography

Will Conley, Idriss Blakey, Heping Liu, Paul Zimmerman, David Hill, Andrew Whittaker, Graeme George

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600630

KEYWORDS: Polymers, Refractive index, Sulfur, Data modeling, Immersion lithography, Plasma etching, Sodium, Molecules, Nitrogen, Polymerization

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Showing 5 of 22 publications

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