Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists
Can ionic liquid additives be used to extend the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly?
Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers
Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications
Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance
Application of quantitative structure property relationship to the design of high refractive index 193i resist
Synthesis of high refractive index sulfur containing polymers for 193 nm immersion lithography: a progress report