Dr. Igor Bouchoms Profile

Dr. Igor Bouchoms

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Publications (7)

Proceedings Article | 12 April 2013 Paper

Extending immersion lithography down to 1x nm production nodes

Wim de Boeij, Remi Pieternella, Igor Bouchoms, Martijn Leenders, Marjan Hoofman, Roelof de Graaf, Haico Kok, Par Broman, Joost Smits, Jan-Jaap Kuit, Matthew McLaren

Proceedings Volume 8683, 86831L (2013) https://doi.org/10.1117/12.2021397

KEYWORDS: Reticles, Scanners, Semiconducting wafers, HVAC controls, Overlay metrology, Calibration, Sensors, Metrology, Distortion, Optical lithography

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Proceedings Article | 13 March 2012 Paper

Extending 1.35 NA immersion lithography down to 1x nm production nodes

Igor Bouchoms, Martijn Leenders, Jan Jaap Kuit, Robert Kazinczi, Roelof de Graaf, Bart Paarhuis, Pieter Gunter, Stefan Weichselbaum, Marcel Beems, Martin Verhoeven, Rob van Ballegoij

Proceedings Volume 8326, 83260L (2012) https://doi.org/10.1117/12.915807

KEYWORDS: Semiconducting wafers, Reticles, Sensors, Scanners, Control systems, Optical alignment, HVAC controls, Wavefronts, Process control, Lithography

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Proceedings Article | 4 March 2010 Paper

Advanced imaging with 1.35 NA immersion systems for volume production

Igor Bouchoms, Jan Mulkens, Sander de Putter, Pieter Gunter, Roelof de Graaf, Marcel Beems, Erwin Verdurmen, Hans Jasper, Nils Dieckmann, Frank Bornebroek

Proceedings Volume 7640, 76401R (2010) https://doi.org/10.1117/12.845597

KEYWORDS: Semiconducting wafers, Reticles, Scanners, Control systems, Imaging systems, Critical dimension metrology, Logic, Overlay metrology, Wavefronts, Optical alignment

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Proceedings Article | 16 March 2009 Paper

Extending single-exposure patterning towards 38-nm half-pitch using 1.35 NA immersion

Igor Bouchoms, Andre Engelen, Jan Mulkens, Herman Boom, Richard Moerman, Paul Liebregts, Roelof de Graaf, Marieke van Veen, Patrick Thomassen, Wolfgang Emer, Frank Sperling

Proceedings Volume 7274, 72741K (2009) https://doi.org/10.1117/12.813649

KEYWORDS: Semiconducting wafers, Imaging systems, Polarization, Optical lithography, Control systems, Critical dimension metrology, Printing, Thin film coatings, Immersion lithography, Lithography

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Proceedings Article | 16 March 2009 Paper

Imaging solutions for the 22nm node using 1.35NA

André Engelen, Melchior Mulder, Igor Bouchoms, Steve Hansen, Anita Bouma, Anthony Ngai, Marieke van Veen, Jörg Zimmermann

Proceedings Volume 7274, 72741Q (2009) https://doi.org/10.1117/12.814155

KEYWORDS: Polarization, Scanners, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Double patterning technology, Image segmentation, Design for manufacturing, Diffraction, Cadmium

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Proceedings Article | 30 July 2002 Paper

CD versu. pitch across the slit for multiple 248-nm step-and-scan exposure tools

Jo Finders, Robert de Kruif, Richard Bruls, Igor Bouchoms

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474571

KEYWORDS: Reticles, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Optical lithography, Data corrections, Deep ultraviolet, Spherical lenses, Monochromatic aberrations, Imaging systems

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Proceedings Article | 26 July 1999 Paper

Understanding systematic and random CD variations using predictive modeling techniques

Donis Flagello, Hans van der Laan, Jan van Schoot, Igor Bouchoms, Bernd Geh

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354328

KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Finite element methods, Monte Carlo methods, Scanners, Systems modeling, Monochromatic aberrations, Lithography, Photoresist materials

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Showing 5 of 7 publications

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