Dr. Igor Bouchoms
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Reticles, Metrology, Optical lithography, Sensors, Calibration, Scanners, Distortion, Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Reticles, Sensors, Scanners, Wavefronts, Control systems, Process control, Optical alignment, Semiconducting wafers, HVAC controls

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reticles, Logic, Imaging systems, Scanners, Wavefronts, Control systems, Optical alignment, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Diffraction, Cadmium, Polarization, Image segmentation, Scanners, Design for manufacturing, Double patterning technology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Polarization, Imaging systems, Control systems, Printing, Immersion lithography, Critical dimension metrology, Thin film coatings, Semiconducting wafers

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top