Dr. Igor V. Fomenkov
Fellow at Cymer LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (51)

Proceedings Article | 9 September 2019
Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

Proceedings Article | 14 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Scanners, Laser applications, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Plasma

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet, High volume manufacturing

Proceedings Article | 10 May 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scanners, Reflectivity, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, EUV optics, Plasma, Tin

Proceedings Article | 5 May 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Current controlled current source

Showing 5 of 51 publications
Conference Committee Involvement (1)
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
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