Dr. Igor V. Fomenkov Profile

Dr. Igor V. Fomenkov

Fellow at ASML San Diego

SPIE Involvement:

Conference Program Committee | Author

Publications (52)

Proceedings Article | 24 March 2020 Presentation

Progress in availably of NXE:3400B EUVL sources in the field and power scaling towards 500W (Conference Presentation)

David Brandt, Igor Fomenkov, Jayson Stewart

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

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Proceedings Article | 9 September 2019 Presentation

Laser-produced plasma incoherent EUV light sources for high-volume manufacturing semiconductor lithography (Conference Presentation)

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown

Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

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Proceedings Article | 14 March 2019 Presentation

Laser produced plasma EUV sources for HVM 7nm node lithography: progress in availability and prospects of power scaling

Igor Fomenkov

Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X

KEYWORDS: Lithography, Scanners, Laser applications, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Plasma

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Proceedings Article | 3 October 2018 Presentation + Paper

NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W

Igor Fomenkov, Michael Purvis, Alexander Schafgans, Yezheng Tao, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alexander Ershov, Robert Rafac, Silvia De Dea, Chirag Rajyaguru, Georgiy Vaschenko, Mathew Abraham, David Brandt, Daniel Brown

Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018

KEYWORDS: Extreme ultraviolet, High volume manufacturing

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Proceedings Article | 10 May 2018 Paper

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Mike Vargas, Spencer Rich, Yezheng Tao, Slava Rokitski, Melchior Mulder, Erik Buurman, Michael Kats, Jayson Stewart, Andrew LaForge, Chirag Rajyaguru, Georgiy Vaschenko, Alex Ershov, Robert Rafac, Mathew Abraham, David Brandt, Daniel Brown

Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX

KEYWORDS: Scanners, Reflectivity, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, EUV optics, Plasma, Tin

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Proceedings Article | 5 May 2017 Presentation

Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Yezheng Tao, Michael Purvis, Slava Rokitski, Georgiy Vaschenko, Robert Rafac, David Brandt

Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Current controlled current source

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Proceedings Article | 18 March 2016 Paper

Advancements in predictive plasma formation modeling

Michael Purvis, Alexander Schafgans, Daniel J. Brown, Igor Fomenkov, Rob Rafac, Josh Brown, Yezheng Tao, Slava Rokitski, Mathew Abraham, Mike Vargas, Spencer Rich, Ted Taylor, David Brandt, Alberto Pirati, Aaron Fisher, Howard Scott, Alice Koniges, David Eder, Scott Wilks, Anthony Link, Steven Langer

Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII

KEYWORDS: Optical lithography, Laser development, Carbon dioxide lasers, Computer simulations, Monte Carlo methods, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Plasma physics, Pulsed laser operation, Performance modeling, Plasma, Liquids, Tin, Absorption

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Proceedings Article | 18 March 2016 Paper

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, Henk Meijer, Arthur Minnaert, Jan-Willem van der Horst, Hans Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, Herman Boom, David Brandt, Daniel Brown, Igor Fomenkov, Michael Purvis

Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII

KEYWORDS: Reticles, Scanners, Manufacturing, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Logic devices, Semiconducting wafers, Overlay metrology, Tin, Fiber optic illuminators

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Proceedings Article | 16 March 2015 Paper

Performance optimization of MOPA pre-pulse LPP light source

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Rick Sandstrom, Alex Ershov, Georgiy Vaschenko, Rob Rafac, Michael Purvis, Slava Rokitski, Yezheng Tao, Daniel Riggs, Wayne Dunstan, Matthew Graham, Nigel Farrar, David Brandt, Norbert Böwering, Alberto Pirati, Noreen Harned, Christian Wagner, Hans Meiling, Ron Kool

Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI

KEYWORDS: Light sources, Laser energy, High power lasers, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Pulsed laser operation, Plasma, Tin

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Proceedings Article | 17 April 2014 Paper

EUV lithography: NXE platform performance overview

Rudy Peeters, Sjoerd Lok, Joerg Mallman, Martijn van Noordenburg, Noreen Harned, Peter Kuerz, Martin Lowisch, Eelco van Setten, Guido Schiffelers, Alberto Pirati, Judon Stoeldraijer, David Brandt, Nigel Farrar, Igor Fomenkov, Herman Boom, Hans Meiling, Ron Kool

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Reticles, Metrology, Logic, Imaging systems, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 17 April 2014 Paper

Laser produced plasma light source development for HVM

Igor Fomenkov, David Brandt, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Daniel Riggs, Robert Rafac, Silvia De Dea, Michael Purvis, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Robert Kazinczi, Alberto Pirati

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Light sources, Deep ultraviolet, Scanners, Hydrogen, Laser applications, Laser development, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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Proceedings Article | 18 March 2014 Paper

LPP EUV source readiness for NXE 3300B

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Daniel Riggs, Robert Rafac, Silvia De Dea, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Alberto Pirati, Robert Kazinczi

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Mirrors, Scanners, Reflectivity, Control systems, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

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Proceedings Article | 8 April 2013 Paper

Collector optic in-situ Sn removal using hydrogen plasma

John Sporre, Dan Elg, David Ruzic, Shailendra Srivastava, Igor Fomenkov, David Brandt

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Carbon, Methane, Contamination, Etching, Hydrogen, Oxygen, Extreme ultraviolet, Antennas, Plasma, Tin

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Proceedings Article | 1 April 2013 Paper

Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond

Igor Fomenkov, David Brandt, Nigel Farrar, Bruno La Fontaine, Norbert Böwering, Daniel Brown, Alex Ershov, David Myers

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Light sources, Metrology, Optical lithography, Laser development, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Plasma, Tin

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Proceedings Article | 1 April 2013 Paper

Lifetime and refurbishment of multilayer LPP collector mirrors

Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Sergiy Yulin, Norbert Kaiser, Andreas Tünnermann, Norbert Böwering, Alex Ershov, Silvia de Dea, Kay Hoffmann, Bruno La Fontaine, Igor Fomenkov, David Brandt

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Mirrors, Multilayers, Light sources, Optical coatings, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma, Tin

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Proceedings Article | 1 April 2013 Paper

CO2/Sn LPP EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

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SPIE Journal Paper | 29 June 2012

Development of stable extreme-ultraviolet sources for use in lithography exposure systems

Igor Fomenkov, Bruno La Fontaine, Daniel Brown, Imtiaz Ahmad, Peter Baumgart, Norbert Bowering, David Brandt, Alexander Bykanov, Silvia De Dea, Alex Ershov, Nigel Farrar, Daniel Golich, Michael Lercel, David Myers, Chirag Rajyaguru, Shailendra Srivastava, Yezheng Tao, Georgiy Vaschenko

JM3 Vol. 11 Issue 02

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

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Proceedings Article | 23 March 2012 Paper

Laser produced plasma EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Michael Lercel, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Alexander Bykanov, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christian Wittak, Michael Woolston, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao

Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III

KEYWORDS: Mirrors, Scanners, Coating, Manufacturing, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma, Tin

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Proceedings Article | 23 March 2012 Paper

Light sources for EUV lithography at the 22-nm node and beyond

Igor Fomenkov, Norbert Böwering, David Brandt, Daniel Brown, Alexander Bykanov, Alex Ershov, Bruno La Fontaine, Michael Lercel, David Myers

Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III

KEYWORDS: Mirrors, Light sources, Ions, Reflectivity, Carbon dioxide lasers, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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Proceedings Article | 8 April 2011 Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt

Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II

KEYWORDS: Optical filters, Light sources, Optical lithography, Scanners, Spectrometers, Laser applications, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

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Proceedings Article | 7 April 2011 Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Bruno La Fontaine, Michael Lercel, Alexander Bykanov, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir Fleurov, Kevin Zhang, Daniel Golich, Silvia De Dea, Richard Hou, Wayne Dunstan, Christian Wittak, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt

Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II

KEYWORDS: Mirrors, Scanners, Reflectivity, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D scanning, Semiconducting wafers, Plasma

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Proceedings Article | 23 March 2010 Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan, David Brandt

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Mirrors, Light sources, Ions, Manufacturing, Reflectivity, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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Proceedings Article | 20 March 2010 Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Mirrors, Scanners, Manufacturing, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

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SPIE Journal Paper | 1 October 2009

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Norbert Böwering, Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, Dave Myers, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

JM3 Vol. 8 Issue 04

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

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Proceedings Article | 18 March 2009 Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, David Brandt, Alexander Bykanov, Alex Ershov, William Partlo, Dave Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Mirrors, Light sources, Sensors, Ions, Coating, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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Proceedings Article | 18 March 2009

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proc. SPIE. 7271, Alternative Lithographic Technologies

KEYWORDS: Mirrors, Light sources, Scanners, Coating, Manufacturing, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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Proceedings Article | 4 December 2008 Paper

Laser-produced plasma source system development

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, David Vidusek, Silvia De Dea, Richard Hou

Proc. SPIE. 7140, Lithography Asia 2008

KEYWORDS: Mirrors, Light sources, Manufacturing, Reflectivity, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma systems, Plasma, Tin

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This paper provides a review of development progress for a laser-produced-plasma (LPP) extreme-ultra-violet (EUV) source with performance goals targeted to meet joint requirements from all leading scanner manufacturers. Laser produced plasma systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at sub-32nm and beyond nodes on the ITRS roadmap. Recent advances in the development of the system, its present average output power level and progress with various subcomponents is discussed. We present the latest results on peak EUV and average EUV power as well as stability of EUV output, measured in burst-mode operation at the nominal repetition rate of the light source. In addition, our progress in developing of critical components, such as normal-incidence EUV collector and liquid-target delivery system is described. We also report on dose stability, plasma position stability and EUV distribution at the output region of the source. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source. The capability to scale LPP power by further development of the high power CO2 drive laser in order to increase duty cycle and duration of continuous light source operation is shown. Production systems with thermal management and capable of 5 sr light collection are being assembled and tested. A description of the development of a normal-incidence ellipsoidal collector is included. Improvements in substrate quality lead to increased EUV reflectance of the mirror. Results on the generation of liquid tin droplets as target material for efficient plasma generation are also described. The droplet generator serves as a key element in the precise and spatially stable delivery of small quantities of liquid tin at high repetition rates. We describe a protection module at the intermediate focus (IF) region of the source and imaging of the EUV distribution using a sub-aperture collector and a fluorescent screen. A path to meet requirements for production scanners planned well into the next decade is also presented.

Proceedings Article | 3 September 2008 Paper

Enhanced reflectivity and stability of high-temperature LPP collector mirrors

Torsten Feigl, Sergiy Yulin, Marco Perske, Hagen Pauer, Mark Schürmann, Norbert Kaiser, Norbert Böwering, Oleg Khodykin, Igor Fomenkov, David Brandt

Proc. SPIE. 7077, Advances in X-Ray/EUV Optics and Components III

KEYWORDS: Mirrors, Multilayers, Annealing, Interfaces, Silicon, Coating, Reflectivity, Extreme ultraviolet, Molybdenum, Plasma

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Proceedings Article | 27 March 2007 Paper

XLR 500i: recirculating ring ArF light source for immersion lithography

D.J. Brown, P. O'Keeffe, V. Fleurov, R. Rokitski, R. Bergstedt, I. Fomenkov, K. O'Brien, N. Farrar, W. Partlo

Proc. SPIE. 6520, Optical Microlithography XX

KEYWORDS: Lithography, Light sources, Optical amplifiers, Oscillators, Laser applications, Laser stabilization, Immersion lithography, Critical dimension metrology, Molybdenum, Pulsed laser operation

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As Argon Fluoride (ArF) lithography moves into high volume production, ArF light sources need to meet performance requirements beyond the traditional drivers of power and bandwidth. The first key requirement is a continuous decrease in Cost of Ownership (CoO) where the industry requirement is for reduction in ArF CoO in line with the historical cost reduction demonstrated for Krypton Fluoride (KrF) light sources. A second requirement is improved light source performance stability. As CD control requirements shrink, following the ITRS roadmap, all process parameters which affect CD variation need tighter control. In the case of the light source, these include improved control of bandwidth, pulse energy stability and wavelength. In particular, CD sensitivity to exposure dose has become a serious challenge for device processing and improvements to laser pulse energy stability can contribute to significantly better dose control. To meet these performance challenges Cymer has designed a new dual chamber laser architecture. The Recirculating Ring design requires 10X less energy from the Master Oscillator (MO). This new configuration enables the MO chamber lifetime to reach that of the power amplifier chamber at around 30Bp. In addition, other optical modules in the system such as the line narrowing module experience lower light intensity, ensuring even longer optics lifetime. Furthermore, the Recirculating Ring configuration operates in much stronger saturation. MO energy instabilities are reduced by a factor of 9X when passed through the Ring. The output energy stability exhibits the characteristics of a fully saturated amplifier and pulse energy stability improvement of 1.5X is realized. This performance enables higher throughput scanner operation with enhanced dose control. The Recirculating Ring technology will be introduced on the XLR 500i, Cymer's fifth-generation dual chamber-based light source built on the production-proven XLA platform. This paper will describe the design details and performance characteristics of the new laser architecture.

Proceedings Article | 21 March 2007 Paper

Laser-produced plasma source system development

Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proc. SPIE. 6517, Emerging Lithographic Technologies XI

KEYWORDS: Sensors, Calibration, Spectroscopy, Ions, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Plasma, Tin

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This paper describes the development of laser produced plasma (LPP) technology as an EUV source for advanced scanner lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for critical layer patterning below 32 nm beginning with beta generation scanners in 2009. This paper describes the development status of subsystems most critical to the performance to meet joint scanner manufacturer requirements and semiconductor industry standards for reliability and economic targets for cost of ownership. The intensity and power of the drive laser are critical parameters in the development of extreme ultraviolet LPP lithography sources. The conversion efficiency (CE) of laser light into EUV light is strongly dependent on the intensity of the laser energy on the target material at the point of interaction. The total EUV light generated then scales directly with the total incident laser power. The progress on the development of a short pulse, high power CO2 laser for EUV applications is reported. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. The deposition of target materials and contaminants, as well as sputtering of the collector multilayer coating and implantation of incident particles can reduce the reflectivity of the mirror substantially over the exposure time even though debris mitigation schemes are being employed. The results of measurements of high energy ions generated by a short-pulse CO2 laser on a laser-produced plasma EUV light source with Sn target are presented. Droplet generation is a key element of the LPP source being developed at Cymer for EUV lithography applications. The main purpose of this device is to deliver small quantities of liquid target material as droplets to the laser focus. The EUV light in such configuration is obtained as a result of creating a highly ionized plasma from the material of the droplets. Liquid tin is the material of choice to be used as a target due to the relatively high CE of the laser energy into in-band EUV radiation. Results obtained with the droplet generator and technical challenges related to successful implementation of the device are discussed.

Proceedings Article | 19 March 2007 Paper

LPP EUV source development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proc. SPIE. 6517, Emerging Lithographic Technologies XI

KEYWORDS: Mirrors, Scanners, Ions, Plasmas, Reflectivity, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Tin

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Proceedings Article | 24 March 2006 Paper

EUV source collector

Norbert Böwering, Alex Ershov, William Marx, Oleh Khodykin, Björn Hansson, Ernesto Vargas L., Juan Chavez, Igor Fomenkov, David Myers, David Brandt

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Mirrors, Multilayers, Light sources, Coating, Reflectivity, Atomic force microscopy, Solids, Extreme ultraviolet, Plasma, Tin

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Proceedings Article | 24 March 2006 Paper

High-temperature LPP collector mirror

Torsten Feigl, Sergiy Yulin, Nicolas Benoit, Norbert Kaiser, Norbert Böwering, Alex Ershov, Oleh Khodykin, John Viatella, Kent Bruzzone, Igor Fomenkov, David Myers

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Mirrors, Multilayers, Annealing, Silicon, Coating, Reflectivity, Atomic force microscopy, Extreme ultraviolet, Silicon carbide, Temperature metrology

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Proceedings Article | 24 March 2006 Paper

High-power low cost drive laser for LPP source

Igor Fomenkov, Björn Hansson, Norbert Böwering, Alex Ershov, William Partlo, Vladimir Fleurov, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas L., Juan Chavez, William Marx, David Brandt

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Optical amplifiers, Oscillators, High power lasers, Laser applications, Gas lasers, Extreme ultraviolet, Excimer lasers, Molybdenum, Neodymium lasers, Carbon monoxide

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We report on the approach for a high-power high-beam-quality drive laser system that is used for a laser-produced plasma (LPP) EUV source. Cymer has conducted research on a number of solutions for a multi-kW drive laser system that satisfy high volume production requirements. Types of lasers to be presented include XeF at 351 nm and CO₂ at 10.6 micron. We report on a high efficiency XeF amplifier with a 3rd harmonic Nd:YLF master oscillator operated in the 6 to 8 kHz range and a CO₂ laser system with Q-switched cavity dumped master oscillator and RF pumped fast axial flow amplifiers operated in the 10 to 100 kHz range. CO₂ laser short pulse gain and optical isolation techniques are reported. Optical performance data and design features of the drive laser system are discussed, as well as a path to achieve output power scaling to meet high volume manufacturing (HVM) requirements and beyond. Additionally, the electrical efficiency as a component of cost of operation is presented. Development of a drive laser with sufficient output power, high beam quality, and economical cost of operation is critical to the successful implementation of a laser-produced-plasma (LPP) EUV source for HVM applications. Cymer has conducted research on a number of solutions to this critical need. We report our progress on development of a high power system with two gas-discharge power amplifiers to produce high output power with high beam quality. We provide optical performance data and design features of the drive laser as well as a path to output power scaling to meet HVM requirements. Development of a drive laser for LPP EUV source is a challenging task. It requires multi-kW laser output power with short pulse duration and diffraction limited beam quality. In addition, this system needs to be very reliable and cost-efficient to satisfy industry requirements for high volume integrated circuit manufacturing. Feasibility studies of high power laser solutions that utilize proven laser technologies in high power optical gain modules and deliver required beam properties have been performed and are reported.

Proceedings Article | 23 March 2006 Paper

LPP EUV source development for HVM

Björn Hansson, Igor Fomenkov, Norbert Böwering, Alex Ershov, William Partlo, David Myers, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas, Rod Simmons, Juan Chavez, William Marx, David Brandt

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Mirrors, Metrology, Lithium, Ions, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

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Proceedings Article | 10 May 2005 Paper

Metrology of laser-produced plasma light source for EUV lithography

N. Boewering, J. Hoffman, O. Khodykin, C. Rettig, B. Hansson, A. Ershov, I. Fomenkov

Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX

KEYWORDS: Optical filters, Mirrors, Metrology, Lithium, Sensors, Spectroscopy, Photodiodes, Extreme ultraviolet, Plasma, Tin

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Proceedings Article | 6 May 2005 Paper

LPP EUV conversion efficiency optimization

J. Hoffman, A. Bykanov, O. Khodykin, A. Ershov, I. Fomenkov, W. Partlo, D. Myers

Proc. SPIE. 5751, Emerging Lithographic Technologies IX

KEYWORDS: Lithium, Spectroscopy, Laser energy, Image analysis, CCD cameras, Extreme ultraviolet, Pulsed laser operation, Plasma, Light, Tin

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Proceedings Article | 6 May 2005 Paper

EUV source system development update: advancing along the path to HVM

D. Myers, I. Fomenkov, B. Hansson, B. Klene, D. Brandt

Proc. SPIE. 5751, Emerging Lithographic Technologies IX

KEYWORDS: Mirrors, Lithium, Ions, Xenon, Extreme ultraviolet, Excimer lasers, Extreme ultraviolet lithography, Neodymium lasers, Plasma, Tin

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Proceedings Article | 6 May 2005 Paper

Protection of collector optics in an LPP based EUV source

C. Rettig, O. Khodykin, J. Hoffman, W. Marx, N. Bowering, E. Vargas, A. Ershov, I. Fomenkov, W. Partlo

Proc. SPIE. 5751, Emerging Lithographic Technologies IX

KEYWORDS: Mirrors, Lithium, Ions, Diffusion, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma, Tin

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Proceedings Article | 6 May 2005 Paper

Development in gas-discharge drive lasers for LPP EUV sources

V. Fleurov, P. Oh, T. Steiger, I. Fomenkov, W. Partlo

Proc. SPIE. 5751, Emerging Lithographic Technologies IX

KEYWORDS: Energy efficiency, Optical amplifiers, Oscillators, High power lasers, Laser applications, Extreme ultraviolet, Molybdenum, Neodymium lasers, Pulsed laser operation, Laser systems engineering

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Proceedings Article | 20 May 2004 Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Boewering, Curtis Rettig, Jerzy Hoffman

Proc. SPIE. 5374, Emerging Lithographic Technologies VIII

KEYWORDS: Carbon, Light sources, Contamination, Electrodes, Magnetism, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

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Proceedings Article | 16 June 2003 Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Bowering, Curtis Rettig, Jerzy Hoffman

Proc. SPIE. 5037, Emerging Lithographic Technologies VII

KEYWORDS: Lithography, Mirrors, Light sources, Metrology, Electrodes, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Zirconium, Plasma

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Proceedings Article | 1 July 2002 Paper

Optimization of a dense plasma focus device as a light source for EUV lithography

Igor Fomenkov, William Partlo, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Boewering

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Mirrors, Light sources, Capacitors, Electrodes, Photodiodes, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed power, Plasma

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Since the initial demonstration of EUV emission with Xenon as a source gas in Cymer's Dense Plasma Focus (DPF) device, significant effort has been spent exploring the parameter space for optimization of efficient generation of EUV radiation. Parameters included in this investigation are He and Xe pressure and flow rates, electrode geometries, pre-ionization characteristics, and duty factor related performance issues. In these investigations it was found that the location of the He (buffer gas) and Xe (working gas) gas injection ports as well as the pressures and flow rates of the gas mixture components had a strong impact on EUV emission efficiency. Additional constraints on the gas recipe are also derived from gas absorption of the EUV radiation and the desire to provide debris mitigation properties. Best results to date have been obtained with an axially symmetric buffer gas injection scheme coupled with axial Xe injection through the central electrode. The highest conversion efficiency obtained was 0.42 percent at 12.4 J of input energy. Measurements of energy stability show a 10 percent standard deviation at near optimum EUV output. The matching of the drive circuit to the pinch as determined by the damping of the voltage overshoot waveforms was found to depend strongly on the He and Xe pressures. Energy Dispersive X-Ray (EDX) analysis of the debris emitted from the source shows that the primary sources of the debris are the central electrode and the insulator. No evidence of cathode material has been found. In addition to efforts toward more efficient operation, first phase efforts of thermal engineering have been undertaken, which have led to continuous operation at 200 Hertz with conventional direct water cooling. The system can be operated at higher repetition rates with proportionally lower duty cycles. The data will show the distribution of thermal power throughout the whole system. This more detailed understanding of the thermal power flow allows us to better determine the ultimate high volume manufacturing potential of this source technology.

Proceedings Article | 20 August 2001 Paper

Progress toward use of a dense plamsa focus as a light source for production EUV lithography

William Partlo, Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, John Rauch

Proc. SPIE. 4343, Emerging Lithographic Technologies V

KEYWORDS: Mirrors, Light sources, Electrodes, Reflectivity, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Grazing incidence, Beryllium, Plasma

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Proceedings Article | 21 July 2000 Paper

Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor

William Partlo, Igor Fomenkov, Ian Oliver, Daniel Birx

Proc. SPIE. 3997, Emerging Lithographic Technologies IV

KEYWORDS: Mirrors, Lithium, Electrodes, Tungsten, Reflectivity, Extreme ultraviolet, Grazing incidence, Prototyping, Plasma, Near field optics

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Proceedings Article | 25 June 1999 Paper

EUV (13.5-nm) light generation using a dense plasma focus device

William Partlo, Igor Fomenkov, Daniel Birx

Proc. SPIE. 3676, Emerging Lithographic Technologies III

KEYWORDS: Mirrors, Lithium, Electrodes, Spectroscopy, Reflectivity, Photodiodes, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma

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Proceedings Article | 29 June 1998 Paper

Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-um line widths

Alexander Ershov, Thomas Hofmann, William Partlo, Igor Fomenkov, George Everage, Palash Das, Dave Myers

Proc. SPIE. 3334, Optical Microlithography XI

KEYWORDS: Lithography, Prisms, Optical lithography, Laser scanners, Laser stabilization, Gas lasers, Excimer lasers, Laser cutting, Pulsed laser operation, Diffraction gratings

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Proceedings Article | 7 July 1997 Paper

Reliability studies of 1-kHz KrF excimer lasers for DUV lithography

Palash Das, Hilary Heinmets, Cynthia Maley, Igor Fomenkov, Ray Cybulski, Donald Larson

Proc. SPIE. 3051, Optical Microlithography X

KEYWORDS: Lithography, Deep ultraviolet, Mercury, Manufacturing, Reliability, Lamps, Excimer lasers, Laser manufacturing, Optics manufacturing

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Proceedings Article | 4 April 1997 Paper

Performance of 1 kHz KrF excimer laser for DUV lithography

Palash Das, Richard Morton, Igor Fomenkov, William Partlo, Richard Sandstrom, Cynthia Maley, Ray Cybulski

Proc. SPIE. 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference

KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Reliability, Laser scanners, Excimer lasers, 3D scanning, Semiconducting wafers, Failure analysis, Pulsed power

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Proceedings Article | 7 June 1996 Paper

Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography

Richard Morton, Igor Fomenkov, William Partlo, Palash Das, Richard Sandstrom

Proc. SPIE. 2726, Optical Microlithography IX

KEYWORDS: Lithography, Safety, Deep ultraviolet, Electrodes, Laser applications, Laser development, Gas lasers, Excimer lasers, Fluorine, Pulsed laser operation

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Proceedings Article | 26 May 1995 Paper

Low cost of ownership KrF excimer laser using a novel pulse power and chamber configuration

William Partlo, Richard Sandstrom, Igor Fomenkov, Palash Das

Proc. SPIE. 2440, Optical/Laser Microlithography VIII

KEYWORDS: Energy efficiency, Switches, Electrodes, Solid state lasers, Laser scanners, Gas lasers, Excimer lasers, 3D scanning, Solid state physics, Pulsed laser operation

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Proceedings Article | 8 August 1993 Paper

High-resolution spectral studies and the absolute-wavelength calibration of a KrF excimer laser for microlithography

Igor Fomenkov, Richard Sandstrom

Proc. SPIE. 1927, Optical/Laser Microlithography

KEYWORDS: Fabry–Perot interferometers, Optical lithography, Scattering, Calibration, Spectroscopy, Laser development, Lamps, Laser scattering, Spectral resolution, Excimer lasers

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Showing 5 of 52 publications

Conference Committee Involvement (3)

International Conference on Extreme Ultraviolet Lithography 2021

26 September 2021 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2020

21 September 2020 | Online Only, California, United States

International Conference on Extreme Ultraviolet Lithography 2019

16 September 2019 | Monterey, California, United States

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