Dr. Igor Turovets
Scientist at Nova Ltd
SPIE Involvement:
Author | Instructor
Publications (28)

Proceedings Article | 27 April 2023 Presentation + Paper
A. Moussa, J. Bogdanowicz, B. Groven, P. Morin, M. Beggiato, M. Saib, G. Santoro, Y. Abramovitz, K. Houtchens, S. Ben Nissim, N. Meir, J. Hung, A. Urbanowicz, R. Koret, I. Turovets, G. Lorusso, A.-L. Charley
Proceedings Volume 12496, 124961X (2023) https://doi.org/10.1117/12.2657968
KEYWORDS: Histograms, Monolayers, Metrology, 2D materials, Silicon, Atomic force microscopy, Scanning electron microscopy, Raman spectroscopy, Scatterometry, Semiconducting wafers

SPIE Journal Paper | 21 February 2023 Open Access
JM3, Vol. 22, Issue 03, 031203, (February 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031203
KEYWORDS: Metrology, Interferometry, Data modeling, Tunable filters, Semiconducting wafers, Scatterometry, Optical filters, Machine learning, Education and training, Dielectrics

Proceedings Article | 8 June 2022 Presentation + Paper
M. Medikonda, D. Schmidt, M. Rizzolo, M. Breton, A. Dutta, H. Wu, E. Evarts, A. Cepler, R. Koret, I. Turovets, D. Edelstein
Proceedings Volume PC12053, PC120530J (2022) https://doi.org/10.1117/12.2614137
KEYWORDS: Metrology, Logic, Data modeling, Resistance, Scatterometry, Machine learning, Critical dimension metrology, Semiconducting wafers, Instrument modeling, Chemical mechanical planarization

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530S (2022) https://doi.org/10.1117/12.2614077
KEYWORDS: Optical filters, Metrology, Data modeling, Dielectrics, Transmission electron microscopy, Scatterometry, Semiconducting wafers, Chemical mechanical planarization, Back end of line, Front end of line

Proceedings Article | 26 May 2022 Presentation + Paper
Gian Francesco Lorusso, Christophe Beral, Janusz Bogdanowicz, Danilo De Simone, Mahmudul Hasan, Christiane Jehoul, Alain Moussa, Mohamed Saib, Mohamed Zidan, Joren Severi, Vincent Truffert, Dieter Van den Heuvel, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Joey Hung, Roy Koret, Igor Turovets, Kit Ausschnitt, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 120530O (2022) https://doi.org/10.1117/12.2614046
KEYWORDS: Signal to noise ratio, Metrology, Fourier transforms, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Image quality, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 28 publications
Course Instructor
SC1100: Scatterometry in Profile, Overlay and Focus Process Control
Scatterometry is an optical method to measure profile characteristics of repetitive features printed on a wafer. These profile characteristics are related to process control parameters for monitoring and control applications. This course explains the basic principles of scatterometry, including HW, measurements methodologies and algorithms. Multiple examples of scatterometry application for process monitoring and control in R&D and high volume semiconductor manufacturing are discussed. A primary goal of the course is to reveal the capabilities and limitations of scatterometry and the consequences for the application space.This course explains the basic principles of scatterometry and its application for process monitoring and control in high volume semiconductor manufacturing. A primary goal of the course is to reveal the capabilities and limitations of scatterometry and the consequences for the application space.
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