Dr. Igor Turovets
Scientist at Nova Measuring Instruments Ltd
SPIE Involvement:
Author | Instructor
Publications (21)

Proceedings Article | 15 May 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Carbon, Metrology, Titanium dioxide, Etching, Silicon, Scanning electron microscopy, Atomic layer deposition, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 4 May 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Photoresist materials, Scatterometry, Machine learning, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Scatterometry, Machine learning, Semiconducting wafers, Back end of line

Proceedings Article | 25 June 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Capacitance, Process control, Machine learning

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Oxides, Diffractive optical elements, Etching, Resistance, Scatterometry, Capacitance, Process control, Machine learning, Critical dimension metrology, Semiconducting wafers

Showing 5 of 21 publications
Course Instructor
SC1100: Scatterometry in Profile, Overlay and Focus Process Control
Scatterometry is an optical method to measure profile characteristics of repetitive features printed on a wafer. These profile characteristics are related to process control parameters for monitoring and control applications. This course explains the basic principles of scatterometry, including HW, measurements methodologies and algorithms. Multiple examples of scatterometry application for process monitoring and control in R&D and high volume semiconductor manufacturing are discussed. A primary goal of the course is to reveal the capabilities and limitations of scatterometry and the consequences for the application space.This course explains the basic principles of scatterometry and its application for process monitoring and control in high volume semiconductor manufacturing. A primary goal of the course is to reveal the capabilities and limitations of scatterometry and the consequences for the application space.
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