Il-Ho Lee
Senior Manager at DongbuAnam Semiconductor
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Zinc, Photoresist materials, Semiconducting wafers, Head-mounted displays, Lithography, Coating, Transition metals, Optical lithography, Spectroscopy, Deep ultraviolet

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Etching, Semiconducting wafers, Coating, Photoresist processing, Transistors, Particles, Inspection, Failure analysis, Critical dimension metrology, Reflectivity

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Oxides, Semiconducting wafers, Photoresist processing, Head-mounted displays, Silicon, Lithography, Fluorine, Chemical mechanical planarization, Optical lithography, Photoemission spectroscopy

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Critical dimension metrology, Logic, Image processing, Overlay metrology, Computer aided design, Manufacturing, Dry etching, Transistors, Etching

Proceedings Article | 19 July 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Optical proximity correction, Scattering, Photomasks, Head, Quartz, Dry etching, Backscatter, Lithium, Chemically amplified resists, Scanning electron microscopy

Proceedings Article | 19 July 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Inspection, Standards development, Manufacturing, Photomasks, Scanning electron microscopy, Environmental sensing, Cadmium sulfide, Chromium, Optical proximity correction, Semiconductors

Showing 5 of 10 publications
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