Mr. Ilan Englard
EU Cooperative Project Manager at
SPIE Involvement:
Author
Publications (25)

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Electron beams, Metrology, Dielectrics, Inspection, Photomasks, Scanning probe microscopy, Semiconducting wafers, Overlay metrology, Back end of line, Copper low-k interconnects, Defect inspection

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Integrated circuit design, Airborne remote sensing, Phase shifts

PROCEEDINGS ARTICLE | April 16, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Logic, Scanners, Scatterometry, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Scanners, 3D metrology, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

PROCEEDINGS ARTICLE | January 24, 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Contamination, Scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | January 24, 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Contamination, Scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 25 publications
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