Ilan Englard
EU Cooperative Project Manager
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 2 August 2018 Presentation + Paper
Kurt Ronse, Bogumila Kutrzeba-Kotowska , Gaoliang Dai, Frank Scholze, Igor Turovets, Laurens Kwakman, Kenslea Anne, Brid Connolly, Markus Bender, Sven Krannich, Vladislav Kaplan, Maxim Rabinovitch, Ishai Swrtsband, Hayley Johanesen, Nikolai Kasper, Ilan Englard, Shimon Levi, Romy Wende
Proceedings Volume 10585, 1058511 (2018) https://doi.org/10.1117/12.2297265
KEYWORDS: Metrology, Extreme ultraviolet, Photomasks, Semiconducting wafers, Signal processing, Transmission electron microscopy, Atomic force microscopy, Etching

Proceedings Article | 28 September 2017 Paper
Violeta Navarro, Hamed Sadeghian, Abbas Mohtashami, Ilan Englard, Dror Shemesh, Nitin Singh Malik
Proceedings Volume 10446, 104460U (2017) https://doi.org/10.1117/12.2279707
KEYWORDS: Semiconducting wafers, Metrology, Inspection, Electron beams, Scanning probe microscopy, Overlay metrology, Dielectrics, Back end of line, Photomasks, Defect inspection, Copper low-k interconnects

Proceedings Article | 17 April 2012 Paper
Orion Mouraille, Maurice Janssen, Yosuke Kojima, Brid Connolly, Jo Finders, Yaron Cohen, Junji Miyazaki, Shmoolik Mangan, Ilan Englard, Masaru Higuchi
Proceedings Volume 8352, 83520H (2012) https://doi.org/10.1117/12.919791
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Scanners, Reticles, Critical dimension metrology, Airborne remote sensing, Optical proximity correction, Phase shifts, Integrated circuit design

Proceedings Article | 16 April 2012 Paper
Karine Jullian, B. Connolly, O. Mouraille, Michael Ben Yishai, M. Higuchi, I. Englard, A. Bouma, J. Miyazaki, Y. Cohen, C. Toma, Jo Finders, J. van Praagh, Y. Kojima, S. Mangan, K. Grim, A. Ngai
Proceedings Volume 8352, 83520G (2012) https://doi.org/10.1117/12.918018
KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, Lithography, Metrology, Scatterometry, Immersion lithography, Logic

Proceedings Article | 4 April 2012 Paper
Yosuke Kojima, Brid Connolly, Orion Mouraille, Jo Finders, Masaru Higuchi, Junji Miyazaki, Yaron Cohen, Shmoolik Mangan, Ilan Englard, Maurice Janssen
Proceedings Volume 8324, 83240B (2012) https://doi.org/10.1117/12.918049
KEYWORDS: Photomasks, Semiconducting wafers, Scanners, Reticles, Critical dimension metrology, Lithography, Metrology, Calibration, Airborne remote sensing, 3D metrology

Showing 5 of 26 publications
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