Ilan Englard
EU Cooperative Project Manager
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 2 August 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Atomic force microscopy, Transmission electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Electron beams, Metrology, Dielectrics, Inspection, Photomasks, Scanning probe microscopy, Semiconducting wafers, Overlay metrology, Back end of line, Copper low-k interconnects, Defect inspection

Proceedings Article | 17 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Integrated circuit design, Airborne remote sensing, Phase shifts

Proceedings Article | 16 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Logic, Scanners, Scatterometry, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Scanners, 3D metrology, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Showing 5 of 26 publications
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