Prof. Ilsin An
at Hanyang Univ
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Optical lithography, Contamination, Image processing, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Prisms, Optical lithography, Air contamination, Laser energy, Pellicles, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

SPIE Journal Paper | 1 March 2010
JNP Vol. 4 Issue 01
KEYWORDS: Ellipsometry, Sensors, Thin films, Gold, Optical properties, Spectroscopic ellipsometry, Crystals, Spectroscopy, Personal digital assistants, Charge-coupled devices

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Photoresist materials, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Microelectromechanical systems, Lithography, Polymers, Image processing, Ultraviolet radiation, 3D modeling, Photoresist materials, Photomasks, Photoresist processing, 3D microstructuring

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Coherence (optics), Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Resolution enhancement technologies

Showing 5 of 27 publications
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