In Wook Cho
at Hanyang Univ
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Polymers, Diffusion, Computer simulations, Monte Carlo methods, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Surface roughness, Monte Carlo methods, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Monte Carlo methods, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top