Dr. Ingo Bork
Product Director MPC at Siemens EDA
SPIE Involvement:
Conference Program Committee | Author
Publications (42)

Proceedings Article | 21 November 2023 Poster + Paper
Rachit Sharma, Ingo Bork, Archana Rajagopalan, Kushlendra Mishra, Mary Zuo
Proceedings Volume 12751, 127511C (2023) https://doi.org/10.1117/12.2687511
KEYWORDS: Photomasks, Nomenclature, Industry, Visualization, Portability, Metrology, Lithography, Design and modelling, Data storage, Data processing

Proceedings Article | 21 November 2023 Poster + Paper
Kushlendra Mishra, Rachit Sharma, Ingo Bork, Mary Zuo, Christof Zillner
Proceedings Volume 12751, 127511E (2023) https://doi.org/10.1117/12.2687760
KEYWORDS: Electron beam lithography, Photomasks, Process modeling, Lithography, Printing, Error analysis

Proceedings Article | 21 November 2023 Presentation + Paper
Bhardwaj Durvasula, Sayalee Gharat, Ranganadh Peesapati, Archana Rajagopalan, Rachit Sharma, Stephen Kim, Ingo Bork
Proceedings Volume 12751, 1275107 (2023) https://doi.org/10.1117/12.2687645
KEYWORDS: Optical proximity correction, Lithography, Algorithm development, Photomasks, Industry

Proceedings Article | 21 November 2023 Poster + Paper
Mary Zuo, Kushlendra Mishra, Rachit Sharma, Ingo Bork, Nassima Zeggaoui
Proceedings Volume 12751, 127511F (2023) https://doi.org/10.1117/12.2687892
KEYWORDS: SRAF, Optical proximity correction, Bias correction, Printing, Semiconducting wafers, Histograms, Model-based design, Design and modelling, Manufacturing, Industry

Proceedings Article | 21 November 2023 Presentation + Paper
Ingo Bork, Rachit Sharma, Malavika Sharma, Archana Rajagopalan, Bhardwaj Durvasula, Kushlendra Mishra, Mary Zuo
Proceedings Volume 12751, 127510Y (2023) https://doi.org/10.1117/12.2688502
KEYWORDS: Modulation, Scattering, SRAF, Photomask technology, Backscatter, Photomasks, Manufacturing, Forward error correction, Extreme ultraviolet, Etching

Showing 5 of 42 publications
Conference Committee Involvement (2)
Photomask Technology 2024
29 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
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