Dr. Ingo Höllein
at Advanced Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Publications (10)

Proceedings Article | 27 May 2009 Paper
J. Foray, B. Bellet, S. HadjRabah, J. Palisson, E. Veran, M. Davenet, A. Favre, P. Sergent, M. Tissier, V. Baudiquez, P. Nesladek, E. Foca, S. Gopalakrishnan, I. Hollein, F. Dufaye, S. Gough
Proceedings Volume 7470, 74700A (2009) https://doi.org/10.1117/12.835172
KEYWORDS: Photomasks, Pellicles, Semiconducting wafers, Manufacturing, Crystals, Contamination, Vacuum purge, Ions, Dry etching, Scanning tunneling microscopy

Proceedings Article | 27 May 2009 Paper
J. Foray, C. Rude, J. Palisson, M. Davenet, A. Favre, D. Cheung, F. Dufaye, S. Gough, P. Richteiger, V. Baudiquez, E. Foca, P. Nesladek, S. Gopalakrishnan, K. Avary, I. Höllein
Proceedings Volume 7470, 747010 (2009) https://doi.org/10.1117/12.835198
KEYWORDS: Photomasks, Contamination, Humidity, Crystals, Prototyping, Crystallography, Manufacturing, Scanning tunneling microscopy, Lithography, Environmental sensing

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712219 (2008) https://doi.org/10.1117/12.801685
KEYWORDS: Photomasks, Semiconducting wafers, Scanners, Inspection, Wafer inspection, Critical dimension metrology, Printing, Metrology, Manufacturing, Defect inspection

Proceedings Article | 2 May 2008 Paper
Jean Marie Foray, Patrice Dejaune, Pierre Sergent, Stuart Gough, D. Cheung, Magali Davenet, Arnaud Favre, C. Rude, T. Trautmann, Michel Tissier, H. Fontaine, M. Veillerot, K. Avary, I. Hollein, R. Lerit
Proceedings Volume 6792, 67920C (2008) https://doi.org/10.1117/12.798586
KEYWORDS: Contamination, Photomasks, Humidity, Lithography, Environmental sensing, Manufacturing, Time metrology, Sensors, Chromatography, Contamination control

Proceedings Article | 3 May 2007 Paper
H. Fontaine, M. Davenet, D. Cheung, I. Hoellein, P. Richsteiger, P. Dejaune, A. Torsy
Proceedings Volume 6533, 65330W (2007) https://doi.org/10.1117/12.736973
KEYWORDS: Photomasks, Contamination, Particles, Semiconducting wafers, Reticles, Ions, Chemical analysis, Standards development, Crystals, Analytical research

Showing 5 of 10 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top