Dr. Ingo Höllein
at Advanced Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Contamination, Crystals, Manufacturing, Humidity, Photomasks, Environmental sensing, Crystallography, Prototyping, Scanning tunneling microscopy

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Contamination, Dry etching, Crystals, Ions, Manufacturing, Pellicles, Photomasks, Semiconducting wafers, Scanning tunneling microscopy, Vacuum purge

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Metrology, Scanners, Manufacturing, Inspection, Printing, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Contamination, Sensors, Manufacturing, Time metrology, Humidity, Photomasks, Chromatography, Environmental sensing, Contamination control

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reticles, Contamination, Particles, Crystals, Ions, Photomasks, Chemical analysis, Analytical research, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Glasses, Computer simulations, Printing, Near field, Photomasks, Extreme ultraviolet, Semiconducting wafers, Phase shifts

Showing 5 of 10 publications
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