Dr. Ingo Höllein
at Advanced Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Photomasks, Contamination, Humidity, Crystals, Prototyping, Crystallography, Manufacturing, Scanning tunneling microscopy, Lithography, Environmental sensing

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Photomasks, Pellicles, Semiconducting wafers, Manufacturing, Crystals, Contamination, Vacuum purge, Ions, Dry etching, Scanning tunneling microscopy

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Photomasks, Semiconducting wafers, Scanners, Inspection, Wafer inspection, Critical dimension metrology, Printing, Metrology, Manufacturing, Defect inspection

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Contamination, Photomasks, Humidity, Lithography, Environmental sensing, Manufacturing, Time metrology, Sensors, Chromatography, Contamination control

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Contamination, Particles, Semiconducting wafers, Reticles, Ions, Chemical analysis, Standards development, Crystals, Analytical research

Showing 5 of 10 publications
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