Inna Tarshish-Shapir
Advanced Application Development Engineer
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Optical design, Light sources, Metrology, Polarization, Inspection, Reflectivity, Interference (communication), Scatterometry, Semiconducting wafers, Electromagnetic simulation, Overlay metrology, Device simulation

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Image processing, Optical testing, Scatterometry, Optical metrology, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Wafer testing, Overlay metrology, Device simulation, Diffraction gratings

Proceedings Article | 10 April 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Diffraction, Metrology, Image processing, Scanning electron microscopy, Scatterometry, Uncertainty analysis, Critical dimension metrology, Performance modeling, Overlay metrology, Diffraction gratings

SPIE Journal Paper | 6 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Metrology, Calibration, Etching, Scanners, Inspection, Optical testing, Scanning electron microscopy, Measurement devices, Overlay metrology

Showing 5 of 7 publications
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