In-Seon Kim
at Hanyang Univ
SPIE Involvement:
Author
Publications (22)

SPIE Journal Paper | October 12, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Wafer-level optics, Optical lithography, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Silicon, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Optical calibration, Tolerancing

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Graphene, Scanners, Silicon, Pellicles, Finite element methods, Extreme ultraviolet, Silicon carbide, Molybdenum, Zirconium, Protactinium

PROCEEDINGS ARTICLE | September 26, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Optical lithography, Contamination, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Neodymium, Lead

Showing 5 of 22 publications
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