Dr. Ioana C. Graur
Technical Lead EDA Strategy at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Principal component analysis, Visual process modeling, Detection and tracking algorithms, Data modeling, Image processing, Scanning electron microscopy, Computer vision technology, Machine vision, Machine learning, Image classification, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Cadmium, Visualization, Databases, Design for manufacturing, Photomasks, Semiconductor manufacturing, Computational lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

SPIE Journal Paper | 19 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

Proceedings Article | 1 April 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Printing, Transmittance, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Image segmentation, Manufacturing, Inspection, Scanning electron microscopy, Frequency modulation, Photomasks, Extreme ultraviolet, Fermium, Image classification, Semiconducting wafers

Proceedings Article | 31 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Optical lithography, Data modeling, Calibration, Scanning electron microscopy, Finite element methods, Cadmium sulfide, Optical proximity correction, Semiconducting wafers, Statistical modeling, Front end of line

Showing 5 of 26 publications
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