Dr. Irene You. Popova
at IBM Corp
SPIE Involvement:
Publications (10)

Proceedings Article | 16 April 2011 Paper
J. M. Gomez, I. Popova, B. Zhang, H. Kry, S. Holmes, S. Nakagawa, T. Murakami, Chan Sam Chang, Cheol Kim
Proceedings Volume 7972, 79722T (2011) https://doi.org/10.1117/12.879866
KEYWORDS: Photoresist processing, Lithography, Germanium, Photomasks, Semiconducting wafers, Critical dimension metrology, Tolerancing, Reflectivity, Etching, Scanners

Proceedings Article | 16 April 2011 Paper
James Cameron, Jin Wuk Sung, Sabrina Wong, Adam Ware, Yoshihiro Yamamoto, Hiroaki Kitaguchi, Libor Vyklicky, Steve Holmes, Irene Popova, Ranee Kwong, Pushkara Rao Varanasi
Proceedings Volume 7972, 797214 (2011) https://doi.org/10.1117/12.881614
KEYWORDS: Lithography, Optical lithography, Control systems, Reflectivity, Coating, Photoresist processing, Antireflective coatings, Etching, Standards development, Bottom antireflective coatings

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78233U (2010) https://doi.org/10.1117/12.865134
KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Silicon, Data modeling, Photomasks, Calibration, Printing, Reflectivity, Photoresist processing

Proceedings Article | 26 March 2010 Paper
James Cameron, John Amara, Jin Wuk Sung, David Valeri, Adam Ware, Kevin O'Shea, Yoshihiro Yamamoto, Hiroaki Kitaguchi, Libor Vyklicky, Irene Popova, Pushkara Varanasi
Proceedings Volume 7639, 76390H (2010) https://doi.org/10.1117/12.846708
KEYWORDS: Semiconducting wafers, Oxides, Lithography, Silicon, Optical lithography, Resistance, Photoresist materials, Electroluminescence, Reflectivity, Critical dimension metrology

Proceedings Article | 1 April 2009 Paper
Hyung-Rae Lee, Irene Popova, JoAnn Rolick, Juan-Manuel Gomez, Todd Bailey
Proceedings Volume 7273, 72730Y (2009) https://doi.org/10.1117/12.814269
KEYWORDS: Photoresist processing, Semiconducting wafers, Reflectivity, Optical proximity correction, Lithography, Photomasks, Line edge roughness, Process control, Critical dimension metrology, Etching

Showing 5 of 10 publications
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