Dr. Irene You. Popova
at IBM Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Etching, Scanners, Germanium, Reflectivity, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Antireflective coatings, Optical lithography, Etching, Coating, Reflectivity, Control systems, Photoresist processing, Standards development, Bottom antireflective coatings

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Data modeling, Calibration, Silicon, Reflectivity, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Oxides, Lithography, Optical lithography, Silicon, Resistance, Reflectivity, Electroluminescence, Photoresist materials, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Etching, Reflectivity, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Lithography, Optical lithography, Reflection, Etching, Polymers, Silicon, Reflectivity, Photoresist materials, Standards development

Showing 5 of 10 publications
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