Irene Shi
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Semiconductors, Lithography, Particles, Photomasks, SRAF, Critical dimension metrology, Mask cleaning

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Oxides, Etching, Distortion, Oxygen, Photomasks, Plasma etching, Edge roughness, Plasma

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Metrology, Visualization, Etching, Manufacturing, Photomasks, Semiconducting wafers, Data analysis

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Etching, Dry etching, Particles, Ions, Gases, Manufacturing, Oxygen, Photomasks, Plasma etching, Plasma

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Opacity, Sensors, Etching, Metals, Glasses, Inspection, Chromium, Photomasks, Phase shifts, Defect inspection

Showing 5 of 12 publications
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