Dr. Irene Su
at
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Cadmium, Photomasks, Extreme ultraviolet, Transistors, Optical proximity correction, Critical dimension metrology, Model-based design, 193nm lithography

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Optical lithography, Cadmium, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Point spread functions, Reticles, Optical lithography, Data modeling, Calibration, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Calibration, Molecules, Diffusion, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling, Fiber optic illuminators, Chemically amplified resists

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Diffraction, Metrology, Cadmium, Scanners, Photomasks, Integrated optics, Integrated circuits, Optical proximity correction, Tolerancing, Fiber optic illuminators

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Optical lithography, Cadmium, Reflection, Calibration, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 8 publications
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