Irina Pundaleva
Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69244H (2008)
KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Quartz, Distortion, Transmittance, Femtosecond phenomena, Refractive index, Binary data, Pulsed laser operation

Proceedings Article | 12 May 2007 Paper
Proceedings Volume 6607, 66070S (2007)
KEYWORDS: Scatterometry, 3D metrology, Extreme ultraviolet, Photomasks, Diffraction, Scatter measurement, Polarization, Metrology, Extreme ultraviolet lithography, Shape analysis

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65180V (2007)
KEYWORDS: Critical dimension metrology, Scatterometry, Scatter measurement, Precision measurement, Polarization, Cadmium, Finite-difference time-domain method, Photomasks, Process control, Diffraction

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65182D (2007)
KEYWORDS: Overlay metrology, Optical alignment, Antireflective coatings, Image analysis, Coating, Semiconductors, Image quality, Finite-difference time-domain method, Optical lithography, Semiconducting wafers

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63491K (2006)
KEYWORDS: Critical dimension metrology, Scatterometry, Polarization, Diffraction, Diffraction gratings, Metrology, Scatter measurement, Overlay metrology, Magnetism, Light scattering

Showing 5 of 6 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top