Irina Pundaleva
Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Diffraction, Refractive index, Femtosecond phenomena, Quartz, Distortion, Transmittance, Photomasks, Semiconducting wafers, Pulsed laser operation, Binary data

Proceedings Article | 12 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Diffraction, Metrology, Polarization, Scatterometry, 3D metrology, Photomasks, Extreme ultraviolet, Shape analysis, Extreme ultraviolet lithography, Scatter measurement

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Diffraction, Finite-difference time-domain method, Cadmium, Polarization, Scatterometry, Precision measurement, Process control, Photomasks, Critical dimension metrology, Scatter measurement

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Antireflective coatings, Finite-difference time-domain method, Optical lithography, Coating, Image analysis, Image quality, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Diffraction, Metrology, Polarization, Light scattering, Magnetism, Scatterometry, Critical dimension metrology, Scatter measurement, Overlay metrology, Diffraction gratings

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Diffraction, Sensors, Spectroscopy, In situ metrology, Scatterometry, Time metrology, Process control, Photomasks, Critical dimension metrology, Diffraction gratings

Showing 5 of 6 publications
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