Dr. Isabel C. Estrada-Raygoza
at IBM Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Polymethylmethacrylate, Defect detection, Etching, Image processing, Silicon, 3D modeling, Scatterometry, Directed self assembly, Line edge roughness, Semiconducting wafers

Proceedings Article | 26 March 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Etching, Line width roughness, Directed self assembly, Chemical reactions, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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