Dr. Isabelle Servin
at CEA-LETI
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 13 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Lithography, Nanostructures, Electron beam lithography, Electron beams, Deep ultraviolet, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Nanolithography, 193nm lithography

Proceedings Article | 16 August 2019 Presentation
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Maskless lithography, Optical alignment, Critical dimension metrology, Semiconducting wafers, Standards development

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Line width roughness, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Electron beam lithography, Etching, Metals, Copper, Scanning electron microscopy, Optical alignment, Semiconducting wafers, System on a chip, Back end of line

Showing 5 of 28 publications
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