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Isamu Funahshi
Director, Field Marketing at Nihon Entegris KK
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Publications (1)
Proceedings Article | 31 March 2010 Paper
Defect performance of a 2X node resist with a revolutionary point-of-use filter
J. Braggin, R. Ramirez, A. Wu, W. Choi, I. Funahshi, K. Yamamoto
Proceedings Volume 7639, 76391E (2010) https://doi.org/10.1117/12.859280
KEYWORDS: Manufacturing, Lithography, Semiconducting wafers, Chemistry, Control systems, Immersion lithography, Manufacturing equipment, Filtering (signal processing), Scanning electron microscopy, Photomicroscopy
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