Mr. Isao Nishimura
Post Doctoral Fellow at Univ of Texas at Austin
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Ultraviolet radiation, Diffusion, Line width roughness, Semiconducting wafers, Polymer thin films, Chemically amplified resists

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Refractive index, Polymers, Water, Sulfur, Chemistry, Imaging spectroscopy, Absorbance, Immersion lithography, Chlorine, Absorption

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Etching, Silicon, Reflectivity, Surface roughness, Photoresist materials, Photomasks, Line width roughness, Line edge roughness, Photoresist processing

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