Isao Nishimura
Post Doctoral Fellow at Univ of Texas at Austin
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Polymers, Diffusion, Line width roughness, Lithography, Optical lithography, Ultraviolet radiation, Semiconducting wafers, Chemically amplified resists, Polymer thin films, Polymethylmethacrylate

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Refractive index, Absorbance, Polymers, Absorption, Chlorine, Immersion lithography, Sulfur, Chemistry, Water, Imaging spectroscopy

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Etching, Photoresist processing, Line width roughness, Lithography, Reflectivity, Photoresist materials, Line edge roughness, Silicon, Photomasks, Surface roughness

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