Dr. Istvan Mohacsi
Postdoctoral Research Associate at Deutsches Elektronen-Synchrotron
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | July 27, 2017
JM3 Vol. 16 Issue 04

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Defect detection, Scattering, Sensors, Scanners, Photons, Inspection, Image restoration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Prototyping

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Microscopes, Diffraction, Reticles, Defect detection, Imaging systems, Scattering, Sensors, Inspection, Image resolution, Photomasks, Extreme ultraviolet, Prototyping, Defect inspection

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Signal to noise ratio, Diffraction, Metrology, Scattering, Sensors, Microscopy, Light scattering, Inspection, Photomasks, Extreme ultraviolet

SPIE Journal Paper | September 16, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Extreme ultraviolet, Photomasks, Coherence imaging, Sensors, Metrology, Diffraction, Reconstruction algorithms, Image resolution, Microscopy, Detection and tracking algorithms

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Metrology, Scattering, Microscopy, Light scattering, Inspection, Laser scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 8 publications
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