Dr. Istvan Mohacsi
Postdoctoral Research Associate at Deutsches Elektronen-Synchrotron
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | July 27, 2017
JM3 Vol. 16 Issue 04

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Sensors, Inspection, Extreme ultraviolet lithography, Reticles, Lithography, Scanners, High volume manufacturing, Diffraction, Photons, Scattering, Image restoration, Defect detection, Prototyping

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Photomasks, Defect inspection, Extreme ultraviolet, Reticles, Microscopes, Inspection, Image resolution, Imaging systems, Scattering, Diffraction, Sensors, Defect detection, Prototyping

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Diffraction, Scattering, Light scattering, Microscopy, Sensors, Metrology, Signal to noise ratio

SPIE Journal Paper | September 16, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Extreme ultraviolet, Photomasks, Coherence imaging, Sensors, Metrology, Diffraction, Reconstruction algorithms, Image resolution, Microscopy, Detection and tracking algorithms

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Diffraction, Scattering, Microscopy, Lithography, Light scattering, Laser scattering

Showing 5 of 8 publications
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