Itaru Kamohara
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Publications (8)

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Optical lithography, Data modeling, Calibration, Resistance, 3D modeling, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Oxides, Visualization, Etching, Metals, Silicon, Manufacturing, Computer simulations, Signal processing, Optical alignment, Semiconducting wafers

Proceedings Article | 19 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Data modeling, Calibration, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Optical lithography, Atrial fibrillation, Data modeling, Calibration, Etching, 3D modeling, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Wafer-level optics, Ellipsometry, Lithography, Diffraction, Etching, Signal processing, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Signal detection

SPIE Journal Paper | 1 April 2011
JM3 Vol. 10 Issue 02
KEYWORDS: Double patterning technology, Reflectivity, Photomasks, Nanoimprint lithography, Lithography, Semiconducting wafers, Image processing, Photoresist processing, Computer aided design, Logic

Showing 5 of 8 publications
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