Dr. Itty Matthew
Senior Engineer at ASML Silicon Valley
SPIE Involvement:
Publications (6)

Proceedings Article | 30 March 2017 Presentation + Paper
Michael Crouse, Lars Liebmann, Vince Plachecki, Mohamed Salama, Yulu Chen, Nicole Saulnier, Derren Dunn, Itty Matthew, Stephen Hsu, Keith Gronlund, Francis Goodwin
Proceedings Volume 10148, 101480H (2017) https://doi.org/10.1117/12.2260865
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Optical lithography, Lithography, Tolerancing, Computational lithography, Design for manufacturability, Manufacturing, Back end of line, Source mask optimization, Photomasks, Logic, Optical proximity correction, Nanoimprint lithography

Proceedings Article | 16 March 2009 Paper
Sohan Mehta, Hyung-Rae Lee, Bassem Hamieh, Chidam Kallingal, Itty Matthew, Ramya Viswanathan, Derren Dunn
Proceedings Volume 7274, 72742Y (2009) https://doi.org/10.1117/12.814296
KEYWORDS: Polarization, Line edge roughness, Optical lithography, Semiconducting wafers, Diffraction, Fiber optic illuminators, Fourier transforms, Critical dimension metrology, Lithography, Reticles

Proceedings Article | 17 October 2008 Paper
Carl Babcock, Yi Zou, Derren Dunn, Zachary Baum, Zengqin Zhao, Itty Matthew, Pat LaCour
Proceedings Volume 7122, 71220R (2008) https://doi.org/10.1117/12.801789
KEYWORDS: SRAF, Optical proximity correction, Resolution enhancement technologies, Photomasks, Critical dimension metrology, Metals, Fiber optic illuminators, Printing, Algorithm development, Detection and tracking algorithms

Proceedings Article | 22 March 2008 Paper
Proceedings Volume 6922, 69220S (2008) https://doi.org/10.1117/12.773088
KEYWORDS: Copper, Scatterometry, Back end of line, Metals, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization, Metrology, Inspection, Dielectrics

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 61530W (2006) https://doi.org/10.1117/12.655925
KEYWORDS: Line edge roughness, Thin film coatings, Scanning electron microscopy, Printing, Lithography, Photoresist processing, Photomicroscopy, Immersion lithography, Image processing, Diffusion

Showing 5 of 6 publications
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