Dr. Itty Matthew
Senior Engineer at ASML Silicon Valley
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Tolerancing, Stochastic processes, Back end of line, Design for manufacturability

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Diffraction, Reticles, Optical lithography, Polarization, Fourier transforms, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Detection and tracking algorithms, Metals, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Algorithm development, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 22 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Metals, Copper, Dielectrics, Inspection, Scatterometry, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization, Back end of line

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Image processing, Diffusion, Scanning electron microscopy, Printing, Immersion lithography, Line edge roughness, Photomicroscopy, Thin film coatings, Photoresist processing

Showing 5 of 6 publications
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