Ivan L. Berry
Director/Advanced Technology at Axcelis Technologies Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Ions, Silicon, Hydrogen, Diffusion, Plasmas, Chemistry, Oxygen, Photoresist materials, Arsenic, Oxidation

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: FT-IR spectroscopy, Deep ultraviolet, Signal attenuation, Etching, Ultraviolet radiation, Nitrogen, Resistance, Oxygen, Plasma etching, Photoresist processing

PROCEEDINGS ARTICLE | September 1, 1998
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Lithography, Ions, Silicon, Distortion, Ion beams, Photomasks, Optical alignment, Silicon carbide, Semiconducting wafers, Projection lithography

PROCEEDINGS ARTICLE | June 5, 1998
Proc. SPIE. 3331, Emerging Lithographic Technologies II
KEYWORDS: Lithography, Optical spheres, X-rays, Silicon, Distortion, Kinematics, Laser induced plasma spectroscopy, Ion beams, Photomasks, Optimization (mathematics)

PROCEEDINGS ARTICLE | May 13, 1994
Proc. SPIE. 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Ions, Distortion, Ion beams, Projection systems, Photomasks, Semiconducting wafers, Projection lithography

PROCEEDINGS ARTICLE | July 9, 1992
Proc. SPIE. 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
KEYWORDS: Optical components, Chromatic aberrations, Monochromatic aberrations, Lenses, Electrodes, Ions, Colorimetry, Ray tracing, Objectives, Geometrical optics

Showing 5 of 6 publications
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