Ivan Lalovic
Founder and Chief Engineer at Gybe LLC
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 4 April 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wafer-level optics, Lithography, Metrology, Optical lithography, Modulation, Scatterometry, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Light sources, Metrology, Optical lithography, Lithographic illumination, Polarization, Scanners, Control systems, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Logic, Optical lithography, Cadmium, Etching, Photoresist materials, Photomasks, Optical simulations, Double patterning technology, Critical dimension metrology

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Optical lithography, Laser drilling, Electroluminescence, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Laser applications, Distortion, Laser stabilization, Optical simulations, Immersion lithography, Critical dimension metrology, Overlay metrology

Showing 5 of 23 publications
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