Dr. Ivan Pollentier
Process Engineer Lithography at IMEC
SPIE Involvement:
Author
Publications (42)

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Particles, Silicon, Hydrogen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Electrons, Chemistry, Photoresist materials, Polymerization, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Chemical reactions

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Chemical reactions

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Spectroscopy, Silicon, Reflectivity, Pellicles, Reflectometry, Transmittance, Extreme ultraviolet, Reflectance spectroscopy, Carbon nanotubes

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Thin films, Reticles, Scanners, Particles, Coating, Resistance, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Wafer-level optics, Carbon, Particles, Reflectivity, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Showing 5 of 42 publications
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