Dr. Ivan Pollentier
Process Engineer Lithography at imec
SPIE Involvement:
Author
Publications (49)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Scattering, Scanners, Particles, Light scattering, Coating, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Atmospheric particles

Proceedings Article | 17 October 2019 Presentation
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Scanners, Particles, Pellicles, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tolerancing

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Polymers, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Semiconducting wafers, Failure analysis, Stochastic processes

SPIE Journal Paper | 13 March 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Pellicles, Extreme ultraviolet, Scattering, Reticles, Diffraction, Image quality, Inspection, Coating, Photomasks, Carbon nanotubes

SPIE Journal Paper | 27 November 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Carbon nanotubes, Coating, Scanners, Hydrogen, Inspection, Photomasks

Showing 5 of 49 publications
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