Dr. Ivan Pollentier
Process Engineer Lithography at IMEC
SPIE Involvement:
Author
Publications (44)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Diffraction, Reticles, Scattering, Coating, Inspection, Pellicles, Image quality, Extreme ultraviolet

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Logic, Optical lithography, Metals, Fourier transforms, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Nanoimprint lithography, Line edge roughness, System on a chip

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Particles, Silicon, Hydrogen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Electrons, Chemistry, Photoresist materials, Polymerization, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Chemical reactions

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Wafer-level optics, Carbon, Particles, Reflectivity, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Spectroscopy, Silicon, Reflectivity, Pellicles, Reflectometry, Transmittance, Extreme ultraviolet, Reflectance spectroscopy, Carbon nanotubes

Showing 5 of 44 publications
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