Ivan R. Sedlacek
at Brewer Science Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020 Presentation + Paper
Yichen Liang, Andrea Chacko, Samantha Oelklaus, Ethan Lowrey, Veerle Van Driessche, Ivan Sedlacek, Ming Luo, Stephen Grannemann, Douglas Guerrero
Proceedings Volume 11326, 1132614 (2020) https://doi.org/10.1117/12.2551671
KEYWORDS: Lithography, Silicon, Extreme ultraviolet lithography, Line width roughness, Polymers, Plasma etching, Photoresist materials

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