In extreme ultraviolet (EUV) lithography, plasmas are used to generate EUV light. Unfortunately, these plasmas expel high-energy ions and neutrals which damage the collector optic used to collect and focus the EUV light. One of the main problems facing EUV source manufacturers is the necessity to mitigate this debris. A magnetic mitigation system to deflect ionic debris by use of a strong permanent magnet is proposed and investigated. A detailed computational model of magnetic mitigation is presented, and experimental results from an EUV source confirm both the correctness of the model and the viability of magnetic mitigation as a successful means of deflecting ionic debris.
The contribution reports the experimental results of preparation of thin metal films (nickel, aluminum) with low surface roughness using high-current impulse magnetron discharge plasma. The coatings were deposited on silica and silicon surfaces. It was found that by applying a certain negative bias voltage to the substrate, one can stimulate the smoothing of the surface topology. For the case of nickel deposition the average surface roughness decreased from about 8 nm to about 2 nm. The discussion of experimental data acquired under different deposition conditions is presented. The results allow us to single out the main factors influencing the surface roughness of the films and to suggest an analytical condition for smoothing process.