Iwao Higashikawa
Photomask Integration Group at Toshiba Corp
SPIE Involvement:
Conference Program Committee | Symposium Chair | Author
Publications (29)

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Lithography, Mueller matrices, Lithographic illumination, Polarization, Lenses, Polarizers, Polarimetry, Photomasks, Semiconducting wafers

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Optical components, Lithography, Lithographic illumination, Polarization, Polarizers, Polarimetry, Photomasks, Immersion lithography, Calcite, Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, FT-IR spectroscopy, Transparency, Polymers, Hydrogen, Manufacturing, Pellicles, Polymerization, Fluorine, 193nm lithography

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Data modeling, Image processing, Manufacturing, Information technology, Photomasks, Semiconducting wafers, System on a chip, Standards development, Design for manufacturability

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Wafer-level optics, Semiconductors, Lithography, Metrology, Lithographic illumination, CCD cameras, Image quality, Photomasks, Semiconducting wafers, Binary data

Proceedings Article | 2 June 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Semiconductors, Reticles, Data modeling, Manufacturing, Photomasks, Semiconducting wafers, System on a chip, Electronic design automation, Standards development, Design for manufacturability

Showing 5 of 29 publications
Conference Committee Involvement (3)
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
Symposium on Photomask and X-Ray Mask Technology
18 April 1996 | Kawasaki City, Japan
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