Dr. Iwao Nishiyama
Research Manager at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (59)

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Carbon, Contamination, Silica, Silicon, Reflectivity, Oxygen, Scanning probe microscopy, Ruthenium, Plasma, Oxidation

SPIE Journal Paper | April 1, 2010
JM3 Vol. 9 Issue 02
KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Transparency, Optical lithography, Polymers, Glasses, Sulfur, Extreme ultraviolet lithography, Immersion lithography, Radium

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Etching, Polymers, Glasses, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Line edge roughness

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Carbon, Mirrors, Chemistry, Bioalcohols, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Ruthenium, Telescopic pixel displays

PROCEEDINGS ARTICLE | March 20, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Carbon, Lithography, Multilayers, Contamination, X-rays, Hydrogen, Reflectivity, Photomasks, Extreme ultraviolet, Tantalum

Showing 5 of 59 publications
Conference Committee Involvement (3)
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
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