Izumi Santo
Manager at Holon Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Metrology, Visualization, Etching, Manufacturing, Photomasks, Semiconducting wafers, Data analysis

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Manufacturing, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Edge roughness, Holons

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Image processing, Ions, Distortion, Feature extraction, Scanning electron microscopy, Photomasks, Optical proximity correction, Edge roughness, Holons

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Calibration, Reliability, Very large scale integration, Optical proximity correction, Computer aided design, Critical dimension metrology, Data conversion, Prototyping, Standards development, Holons

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Reticles, Statistical analysis, Calibration, Optical testing, Time metrology, Photomasks, Critical dimension metrology, Line edge roughness, Edge roughness

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