Dr. Jérôme Rêche
Advanced Lithography Researcher at CEA-LETI
SPIE Involvement:
Area of Expertise:
Metrology , Microelectronic , Data treatment , Microscopy , X-Ray , Data fusion
Publications (17)

Proceedings Article | 10 April 2024 Poster
Api Warsono, Diana Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle D'Affroux, Chiara Sabbione
Proceedings Volume PC12956, PC1295613 (2024) https://doi.org/10.1117/12.3014929
KEYWORDS: Photoresist processing, Nanoimprint lithography, UV optics, Silicon, Silica, Semiconducting wafers, Microlens, Lithography, Grayscale lithography, Etching

Proceedings Article | 9 April 2024 Poster + Paper
Diana Fernandez Rodas, Jérôme Rêche, Ivanie Mendes, Raluca Tiron
Proceedings Volume 12956, 129560L (2024) https://doi.org/10.1117/12.3009978
KEYWORDS: Nanoimprint lithography, Manufacturing, Atomic force microscopy, Electron beam lithography, Deformation, Shrinkage, Semiconducting wafers, Scanning electron microscopy, Photoresist processing, Standards development, Grayscale lithography

SPIE Journal Paper | 8 March 2024
Timothée Choisnet, Abdelali Hammouti, Vincent Gagneur, Jérôme Reche, Guido Rademaker, Guillaume Freychet, Guillaume Jullien, Julien Ducoté, Patrice Gergaud, Delphine Le Cunff
JM3, Vol. 23, Issue 01, 014002, (March 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014002
KEYWORDS: Critical dimension metrology, Transmission electron microscopy, Cadmium, X-rays, Synchrotrons, Silicon, Semiconducting wafers, Lithography, Scanning electron microscopy, Chromium

Proceedings Article | 3 October 2023 Presentation + Paper
Diana Fernandez Rodas, Jérôme Rêche, Raluca Tiron
Proceedings Volume 12653, 126530F (2023) https://doi.org/10.1117/12.2676111
KEYWORDS: Advanced patterning, Electron beam lithography, Grayscale lithography, Material characterization, Manufacturing, Nanoimprint lithography, Scanning electron microscopy, Adhesion, Ultraviolet radiation, Deformation, Silicon, Interfaces, Atomic force microscopy, Shrinkage

Proceedings Article | 1 May 2023 Poster + Paper
Proceedings Volume 12497, 124970Q (2023) https://doi.org/10.1117/12.2655105
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Distortion, Optical alignment, Lithography, Metrology, Industry, Overlay metrology

Showing 5 of 17 publications
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