Jérôme Reche
at CEA-LETI
SPIE Involvement:
Author
Area of Expertise:
Metrology , Microelectronic , Data treatment , Microscopy , X-Ray , Data fusion
Profile Summary

A PhD Student in metrology for microelectronics with 3 years of experience in lithography process and one year in software development, who also holds a keen interest on information technology. I believe that the future of metrology resides on data treatment and especially data fusion.
Publications (4)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Diffraction, Metrology, Fourier transforms, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Manufacturing, Computer programming, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness, Statistical modeling, Edge roughness

SPIE Journal Paper | 31 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Metrology, Line width roughness, Critical dimension metrology, Sensors, X-rays, Scanning electron microscopy, Reflectivity, Scattering, Reliability, Manufacturing

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, X-rays, Manufacturing, Reliability, Reflectivity, Scanning electron microscopy, Microelectronics, Line width roughness, Critical dimension metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top