Jérôme Rêche
at CEA-LETI
SPIE Involvement:
Author
Area of Expertise:
Metrology , Microelectronic , Data treatment , Microscopy , X-Ray , Data fusion
Profile Summary

A PhD Student in metrology for microelectronics with 3 years of experience in lithography process and one year in software development, who also holds a keen interest on information technology. I believe that the future of metrology resides on data treatment and especially data fusion.
Publications (7)

Proceedings Article | 22 February 2021 Poster + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Nanotechnology, Lithography, Metrology, Optical lithography, Scanning electron microscopy, Photonics, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Standards development

Proceedings Article | 25 March 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Edge detection, Statistical analysis, Polymethylmethacrylate, Ultraviolet radiation, Software development, Polymerization, Line width roughness, Directed self assembly, Binary data

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Diffraction, Metrology, Fourier transforms, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Manufacturing, Computer programming, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness, Statistical modeling, Edge roughness

Showing 5 of 7 publications
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