Mr. Jérôme Rêche Profile

Jérôme Rêche

at CEA-LETI

SPIE Involvement:

Author

Area of Expertise:

Metrology , Microelectronic , Data treatment , Microscopy , X-Ray , Data fusion

Profile Summary

A PhD Student in metrology for microelectronics with 3 years of experience in lithography process and one year in software development, who also holds a keen interest on information technology. I believe that the future of metrology resides on data treatment and especially data fusion.

Publications (7)

Proceedings Article | 22 February 2021 Poster + Paper

Data fusion by artificial neural network for hybrid metrology development

L. Penlap Woguia, J. Reche, M. Besacier, P. Gergaud, G. Rademaker

Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

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Proceedings Article | 22 February 2021 Presentation + Paper

Integration of sub 50 nm features based on EVG SmartNIL for 8-inch substrates

Jérôme Rêche, Maxime Argoud, Anaïs De Lehelle D'Affroux, Khatia Benotmane, Sebastian Haumann, Jonas Khan, Martin Eibelhuber

Proc. SPIE. 11610, Novel Patterning Technologies 2021

KEYWORDS: Nanotechnology, Lithography, Metrology, Optical lithography, Scanning electron microscopy, Photonics, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Standards development

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Proceedings Article | 25 March 2020 Paper

Block copolymer line roughness measurement via PSD: application to fingerprint samples

Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, Guido Rademaker, Romain Jarnias, Charlotte Bouet, Célia Nicolet, Christophe Navarro, Maxime Argoud, Raluca Tiron

Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

KEYWORDS: Edge detection, Statistical analysis, Polymethylmethacrylate, Ultraviolet radiation, Software development, Polymerization, Line width roughness, Directed self assembly, Binary data

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Proceedings Article | 26 March 2019 Presentation + Paper

Application of PSD for the extraction of programmed line roughness from SAXS

Jérôme Reche, Maxime Besacier, Patrice Gergaud, Yoann Blancquaert

Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII

KEYWORDS: Diffraction, Metrology, Fourier transforms, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness

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Proceedings Article | 19 September 2018 Paper

Manufacturing of roughness standard samples based on ACF/PSD model programming

Jérôme Reche, Maxime Besacier, Patrice Gergaud, Yoann Blancquaert

Proc. SPIE. 10775, 34th European Mask and Lithography Conference

KEYWORDS: Lithography, Metrology, Manufacturing, Computer programming, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness, Statistical modeling, Edge roughness

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SPIE Journal Paper | 31 July 2018

Programmed line width roughness metrology by multitechniques approach

Jérôme Reche, Maxime Besacier, Patrice Gergaud, Yoann Blancquaert, Guillaume Freychet, Thibault Labbaye

JM3 Vol. 17 Issue 04

KEYWORDS: Metrology, Line width roughness, Critical dimension metrology, Sensors, X-rays, Scanning electron microscopy, Reflectivity, Scattering, Reliability, Manufacturing

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Proceedings Article | 13 March 2018 Presentation + Paper

Programmed LWR metrology by multi-techniques approach

Jérôme Reche, Maxime Besacier, Patrice Gergaud, Yoann Blancquaert, Guillaume Freychet, Thibault Labbaye

Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII

KEYWORDS: Metrology, X-rays, Manufacturing, Reliability, Reflectivity, Scanning electron microscopy, Microelectronics, Line width roughness, Critical dimension metrology

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Showing 5 of 7 publications

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