Dr. J. Christopher Taylor
R&D Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Infrared imaging, Microscopy, Copper, 3D metrology, Optical alignment, Semiconducting wafers, Tolerancing, Infrared microscopy, Wafer bonding, Overlay metrology

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Refractive index, Optical properties, Water, Electrons, Refraction, Absorbance, Immersion lithography, Sodium, Absorption

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Refractive index, Optical properties, Reflection, Metals, Water, Interfaces, Refraction, Absorbance, Immersion lithography, Digital micromirror devices

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Refractive index, Nanoparticles, Polymers, Crystals, Composites, Dielectrics, Photonic crystals, Refraction, Photorefractive polymers

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Microfluidics, Reflection, Polymers, Glasses, Scanners, Dewetting, Photoresist materials, Photomasks, Immersion lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Polymers, Water, Interfaces, Photoresist materials, Scintillation, Immersion lithography, Fluorine, Semiconducting wafers, Signal detection, Liquids

Showing 5 of 10 publications
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