Mr. J. Marc Pedulla
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Mathematical modeling, Microscopes, Metrology, Calibration, Light scattering, Photomasks, Optical simulations, Semiconducting wafers, Process modeling, Standards development

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Microscopes, Metrology, Nano opto mechanical systems, Interferometers, Calibration, Ultraviolet radiation, Error analysis, Objectives, Photomasks, Standards development

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Microscopes, Metrology, Nano opto mechanical systems, Interferometers, Calibration, Image processing, Ultraviolet radiation, Error analysis, Photomasks, Standards development

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