Dr. Jeimoon Yun
Student at Univ of Chicago
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Etching, Polymers, Image processing, Silicon, Oxygen, Plasma etching, Line edge roughness, Reactive ion etching, Photoresist processing, Plasma

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Ultraviolet radiation, Diffusion, Resistance, Lamps, Printing, Absorbance

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Near ultraviolet, Etching, Silicon, Chemistry, Scanning electron microscopy, Photoresist materials, Epoxies, Cesium, Semiconducting wafers

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