Dr. Jing Guo
Advisory Engineer/Scientist at IBM Thomas J. Watson Research Ctr
SPIE Involvement:
Profile Summary

Advisory Engineer/Scientist at IBM Research in Albany, NY since 2016. Research focus: semiconductor material and process technology. Currently working on advanced patterning for N7 and B7 technology enablement and patterning fundamental study, including materials performance improvement and novel patterning processes. Ph.D. in Chemistry from UMASS Amherst.
Publications (16)

Proceedings Article | 24 February 2021 Presentation + Paper
Proceedings Volume 11609, 116090U (2021) https://doi.org/10.1117/12.2582563
KEYWORDS: Optical lithography, Etching, Stochastic processes, Semiconducting wafers, Resolution enhancement technologies, Extreme ultraviolet lithography, Scanners, Inspection, Source mask optimization, Photoresist processing

SPIE Journal Paper | 1 July 2020 Open Access
JM3, Vol. 19, Issue 03, 034001, (July 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.3.034001
KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 17 April 2020 Presentation + Paper
Cheng Chi, Hao Tang, Oseo Park, Jing Xue, Jing Guo, Geng Han, Charlie King, Jeff Shearer, Sean Burns
Proceedings Volume 11327, 113270E (2020) https://doi.org/10.1117/12.2550834
KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Data modeling, Yield improvement, Optics manufacturing, Optical lithography, Deep ultraviolet, Logic

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 113230O (2020) https://doi.org/10.1117/12.2551487
KEYWORDS: Stochastic processes, Line edge roughness, Inspection, Defect inspection, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Etching, Bridges

Proceedings Article | 26 March 2019 Presentation + Paper
Chi-Chun Liu, Richard Farrell, Kafai Lai, Yann Mignot, Eric Liu, Jing Guo, Yasuyuki Ido, Makoto Muramatsu, Nelson Felix, David Hetzer, Akiteru Ko, John Arnold, Daniel Corliss
Proceedings Volume 10958, 109580L (2019) https://doi.org/10.1117/12.2515862
KEYWORDS: Metals, Critical dimension metrology, Etching, Directed self assembly, Optical lithography, Back end of line, Lithography, Overlay metrology

Showing 5 of 16 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top